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   Your location > Systems > Stand-alone Systems > LEEM/PEEM NAP

FE-LEEM/PEEM P90 NAP

Low Energy Electron / Photoelectron Emission Microscope for Operando Studies under Near Ambient Pressure Conditions

FE-LEEM/PEEM P90 NAP

 

Product Description:

Low Energy Electron Microscopy and Photoelectron Emission Microscopy are the only electron microscopic methods that are really sensitive to the topmost layer of the surface. In combination with the spectroscopic information it is a unique tool for the characterization of dynamic processes at surfaces, like surface reactions. Often the pressure range of standard LEEM/PEEM is not sufficient. Furthermore solid/vapor and liquid/vapor interfaces are omnipresent in nature and the basis for important applications. Thus, investigations at near ambient pressure (NAP) conditions are a key to understanding processes at these interfaces. Analysis techniques like NAP-XPS can work at gas pressures orders of magnitude higher than typical ultra high vacuum conditions. Near Ambient Pressure LEEM and PEEM (NAP-LEEM/PEEM) is the new addition to the tool box, finally allowing for microscopic operando studies under NAP conditions down to the nanoscale.

 

Features:

  • Working pressures from UHV up to Near Ambient Pressure conditions up to 1 mbar
  • Sample temperatures up to 1000C
  • Lateral resolution <30 nm
  • Integrated imaging energy filter
  • Cold field emission gun for LEEM
     

    Applications:

    LEEM NAP measurements

     


     

     

     



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    FE-LEEM/PEEM P90 NAP
    Brochure

    FE-LEEM/PEEM P90 NAP



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