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   Your location > Systems > Stand-alone Systems > LEEM/PEEM

The SPECS LEEM instrument: FE-LEEM P90

FE-LEEM P90
       

Features

  • 5 nm resolution
  • 90 magnetic deflector
  • Cold Field emitter
  • Energy filter (optional)
  • Rapid LEED/LEEM switching
  • Fast sample exchange
  • Energy filtered PEEM with focussing UV source UVS 300
  • Aberration corrector, upgrade option, <2nm resolution
       
Applications
    
  PEEM (Photoelectron Emission
 Microscopy)
 
 Reflective.gif Reflectivity Contrast
mem.gif
 MEM (Mirror Electron Microscopy)
 LEED.gif LEED (Low Energy Electron Diffraction)
DarkField.gif
 Dark field imaging
 microdifraction.gif
 Microdiffraction 
PhaseContrast.gif
 Phase contrast
 e-loss
 Spectroscopy with energy filter 
       

Product Description
The SPECS LEEM instrument FE-LEEM P90 is a next generation Low Energy Electron Microscope with unsurpassed 5 nm resolution for dynamic LEEM microscopy experiments. With this instrument, based on the design of Dr. Rudolf Tromp, nanometer scale processes on surfaces can be observed in real-time.

Guiding the design of the SPECS FE-LEEM P90 was the goal to achieve an extremely high resolution with a minimum number of electronoptical elements.
In order to achieve this incoming and outgoing electrons are separated by a 90 magnetic prism array. This geometry allows a simple, intuitive step by step adjustment of all lens parameters. The magnetic prism transfers both the LEEM image and the LEED pattern astigmatically, allowing routine switching between real image and diffraction. Both image and LEED pattern are transferred without the negative effects of chromatic dispersion, offering superior image and diffraction capabilities.
A sophisticated energy filter enables imaging with an energy resolution down to 250 meV with a minimal impact on the high spatial resolution of the instrument.
The FE-LEEM P90 is integrated into a UHV LEEM sample analysis chamber with facilities for sample preparation and in-situ high temperature sample processing.

The SPECS LEEM instrument can be upgraded with an electron mirror for aberration correction, which is currently developed by Dr. Rudolf Tromp. The design resolution for the corrected FE-LEEM P90 is below 2nm.

 

 

 

 


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FE-LEEM/PEEM P90
Product Brochure
FE-LEEM/PEEM P90 Family Brochure


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