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   Your location > News > News Archiv 2006

SPECS launches new LEEM/PEEM instrument: FE-LEEM P90

2005/12/25
A next generation Low Energy Electron Microscope with unsurpassed 5 nm resolution for dynamic LEEM Microscopy experiments is now available from SPECS GmbH, Berlin. With this instrument, based on the design of Dr. Rudolf Tromp, nanometer scale processes on surfaces can be made visible in real-time on videos of ultimate atomic performance. Low Energy Electron Microscopy has developed into a key technique for research in the field of surface dynamical processes. Contrasting to typical electron microscopes which use high energy electrons, in a LEEM electrons are slowed down to energies of not more then several ten eV before they interact with the sample. Therefore the information only comes from the very surface of the sample. True, in situ observation and analysis of processes during growth are thereby possible. Guiding the design of the SPECS FE-LEEM P90 was the goal to achieve the highest resolution with a minimum number of electronoptical elements. The deflection of the incoming and outgoing electrons is done with a 90 electromagnetic prism array. This geometry allows a simple, intuitive step by step adjustment of the lens parameters. Another advantage is that the magnetic prism transfers both the LEEM image and the LEED pattern astigmatically, allowing routine switching between real and diffraction. The setup of the prism is simple and fast. Due to the closely coupled designs of the prism array and the objective lens system, both image and LEED pattern are transferred without the negative effects of chromatic dispersion, offering superior image and diffraction capabilities. Energy filtering is possible with very few additional electron optical components. This enables imaging with an energy resolution down to 250meV with a minimal impact on the high spatial resolution of the instrument. The SPECS FE-LEEM P90 is integrated into the UHV LEEM sample analysis chamber with facilities for sample preparation and in-situ high temperature sample processing.



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FE-LEEM P90 Features:

  • Unsurpassed 5nm resolution for dynamic LEEM microscopy experiments
  • Real time imaging of surface dynamic processes 90 magnetic deflector
  • Cold field emitter
  • Rapid LEED / LEEM switching
  • Facilities for fast sample exchange, preparation and in situ high temperature processing
  • Self shielding design of magnetic lenses
  • Straight forward adjustment of e-beam

 



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