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RHEED Gun RHD-30
 | | | Features:
- Electron Energy: 1 - 30 keV
- Beam Current: < 0.01 - 50 µA
- Focal length: 200 mm - 1 m
- Spot size: < 100 µm
- Operating pressure: 10-11 to 10-4 mbar, up to 1 mbar with HP Option
- Bakeout up to 200 °C
Applications: - Thin Film Deposition
- Molecular Beam Epitaxy
- Chemical Vapour Deposition
- Sputter Deposition (may need differential pumping)
- Pulsed Laser Deposition
- Other coating and deposition techniques
Product Description: The SPECS 30 kV RHEED (Reflection High Energy Electron Diffraction) electron gun RHD-30 is a fully UHV compatible RHEED gun bakeable to 200 °C and includes all the features and options required to take advantage of this powerful analysis technique. Capable of being operated over a wide range of pressures RHEED can be used in a variety of applications (see above). |
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RHD-30 Product Brochure
RHD-NAP Product Brochure
 To all customers of former Oxford Scientific Ltd.: SPECS has taken over the product line of deposition sources and RHEED from Oxford Scientific in 2006, with Dr. Christian Bradley still involved in the further development of the products. Please contact us for details: support@specs.de Phone: +49 30 467824 0
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