|
|
 |
Ultraviolet Source UVS 300
 | | | | | Features: - High Flux
- Easy installation and operation
- Small Spot and Monochromator Options
- Easy filament replacement through micro-valve
- Best He II intensity on the market
- High plasma density
Optional Feature: Focus capillary
High resolution photoemission measurements demand not only a highest performance electron spectrometer, but also a UV source with high flux density and small spot size, especially for angular resolved studies. SPECS has developed a focused UV source on the basis of the proven technology of the UVS 300 source. Using a special capillary, this source can be focused down to a theoretical spot size of 500 micrometers. Applications: - Angular Resolved Ultraviolet Photoelectron Spectroscopy (ARUPS)
- Fermi Surface Mapping
|  Zoom | | Simulated spot profiles using the Monte-Carlo multiple scattering ray-tracing program. Left: standard quartz capillary. Right: focusing capillary. |  Zoom | | Measured spot profiles, using a Faraday cup with a 115 micrometer entrance aperture. Left: standard quartz capillary. Right: focusing capillary. | | | | | Product description: For ultraviolet photoelectron spectroscopy on solids (UPS), the high performance Ultraviolet Source UVS 300 is ideally suited. The UVS 300 generates a high density plasma by guiding the electrons extracted from a hot cathode filament along the lines of a strongly inhomogeneous magnetic field towards the small discharge region (duo-plasmatron principle). The strong vacuum ultraviolet radiation is extracted from the cathode side by the combination of a metal and a quartz capillary. Differential pumping (50 l/s) between these two capillaries enables to work at very low pressure in the analysis chamber (∼ 1x10-9 mbar or below).
| | Installation of the UVS 300 is easy because the source has only one differential pumping stage. | |  Zoom |
|
 |
UVS 300 catalogue for download
|
 |
|