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Mini ECR Plasma Source MPS-ECR
Plasma source, atom source or ion source
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- Filamentless design
The absence of a hot filament to create the plasma, permits operation with most gases including reactive gases such as oxygen, chlorine, nitrogen and hydrogen.
- No microwave tuning required
Simply turn the plasma on and off.
- Unique integrated shutter and current monitor option
Allows beam density and residual current measurements to be made while the beam is shut off.
- Trivial bakeout preparation ~1minute
Remove only the microwave generator and cables (no water-jacket disassembly).
- Built in microwave generator/tuner
Eliminates the need for waveguide installation. The sophisticated microwave tuner allows tuning to be optimized for each mode for maximum performance.
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Ion Beam Deposition
Ion Beam Assisted Deposition (IBAD)
Oxide growth: HTc superconductors, optical coatings, dielectrics
Reactive sputtering, laser ablation
Ceramic growth, Al2O3
Post growth oxidation/low temperature: SiO2
- Nitrogen Nitriding: GaN, AlN, InN, SiN
Growth enhancement / surfactant
- Methane (carbon)
- Can be used as plasma source, atom source or ion source
|Product Description: |
The SPECS Mini ECR plasma source is a truly UHV compatible source. Fully bakeable, with an all-welded stainless steel vacuum envelope, and outstanding cooling from a full length water-jacket, it is suitable for use in vacuum levels ranging from HV to those found in the most demanding MBE applications. Through the action of the well-known electron cyclotron resonance (ECR) phenomenon, a high density plasma is created by coupling a radially symmetric 2.45 GHz microwave field to ions on the 86 mT surface of a multi-polar magnetic array. A unique combination of features and options make this an extraordinarily versatile plasma source.
MPS ECR product brochure
To all customers of
former Oxford Scientific Ltd.:
SPECS has taken over
the product line of deposition
sources from Oxford Scientific
in 2006, with Dr. Christian Bradley
still involved in the further
development of the sources.
For more information contact us