Features: Filamentless design The absence of a hot filament to create the plasma, permits operation with most gases including reactive gases such as oxygen, chlorine, nitrogen and hydrogen. No microwave tuning required Simply turn the plasma on and off. Unique integrated shutter and current monitor option Allows beam density and residual current measurements to be made while the beam is shut off. Trivial bakeout preparation ~1minute Remove only the microwave generator and cables (no water-jacket disassembly). Built in microwave generator/tuner Eliminates the need for waveguide installation. The sophisticated microwave tuner allows tuning to be optimized for each mode for maximum performance.

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• Argon
  Ion Beam Deposition
  Ion Beam Assisted Deposition (IBAD)
• Oxygen
  Oxide growth: HTc superconductors, optical coatings, dielectrics
  Reactive sputtering, laser ablation
  Ceramic growth, Al₂O₃
  Oxygen cleaning
  Oxidation kinetics
  Post growth oxidation/low temperature: SiO₂
• Nitrogen Nitriding: GaN, AlN, InN, SiN
  Doping: ZnSe
  Alloying: GaAlAsN
• Hydrogen
  Cleaning
  Growth enhancement / surfactant
• Chlorine
  In-situ etching
• Methane (carbon)
  SiC
• Can be used as plasma source, atom source or ion source

Product Description:
The SPECS Mini ECR plasma source is a truly UHV compatible source. Fully bakeable, with an all-welded stainless steel vacuum envelope, and outstanding cooling from a full length water-jacket, it is suitable for use in vacuum levels ranging from HV to those found in the most demanding MBE applications. Through the action of the well-known electron cyclotron resonance (ECR) phenomenon, a high density plasma is created by coupling a radially symmetric 2.45 GHz microwave field to ions on the 86 mT surface of a multi-polar magnetic array. A unique combination of features and options make this an extraordinarily versatile plasma source.