• Cold cathode (Penning type) high current sputter source
• Ion current up to 50µA
• Ion energy 0.2 - 6 keV
• Beam diameter 10mm - 20mm
  
• Flat beam profile
• Filamentless design

• Suitable for reactive gases
• Sputter Gun: Sputtering of large sputter areas at high sputter rates
  

Product Description:
The ion source IQP 10/63 is a cold cathode ion source for rapid cleaning of large surface areas. It has a very flat beam profile. The energy range is about 200 eV to 6 keV. Because of its filamentless design, no replacement of used up filaments is needed. Thus the IQP 10/63  is an economic and at the same time easy to handle research instrument.