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   Your location > Components > Ion Sources > IQP 10/63

Ion Source IQP 10/63

Ion Source IQP 10/63
 
Features:
  • Cold cathode (Penning type) high current sputter source
  • Ion current up to 50ľA
  • Ion energy 0.2 - 6 keV
  • Beam diameter 10mm - 20mm
  • Flat beam profile
  • Filamentless design
Applications:
  • Suitable for reactive gases
  • Sputter Gun: Sputtering of large sputter areas at high sputter rates

Product Description:
The ion source IQP 10/63 is a cold cathode ion source for rapid cleaning of large surface areas. It has a very flat beam profile. The energy range is about 200 eV to 6 keV. Because of its filamentless design, no replacement of used up filaments is needed. Thus the IQP 10/63  is an economic and at the same time easy to handle research instrument.

 



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IQP 10/63 Product Brochure


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