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   Your location > Components > Ion Sources > IQE 11/35

Ion Source IQE 11/35

Ion Source IQE 11/35
   
 Features:
  • High ion beam current
  • Beam free of impurities
  • Suitable for reactive gases, like Oxygen
  • Insertion depth adaptable to requirements
  • Long term stable operation
  • Excellent price/performance ratio
  • Available with either analog or digital power supply

Application:

  • Sputter Gun: Sputter cleaning of samples in UHV

Product Description:

IQE 11/35Cross Section through IQE 11/35  The IQE 11/35 is a very stable extractor type ion source operating with a long-lifetime special Yttrium oxide coated Iridium filament. As a compact, easy-to-handle extractor type ion source the IQE 11/35 is suitable for reactive and non-reactive gases. The source is mounted on a 2.75" (NW35CF) flange and is available with a digital or an analog power supply. The IQE 11/35 generates an ion current of 10-15 ľA (Argon) with a Gaussian beam profile. The beam diameter (FWHM) and current density depend on the source-to-sample distance.
The mounting length of the source is adaptable to individual requirements (standard 62.5 mm, 120 mm, 190 mm or 250 mm). The direct gas transfer in the ionization area works via a gas line on an integrated Mini-Conflat Flange (NW16CF). Typically, the pressure in the UHV chamber remains in the 10-5 to 10-6 hPa range during operation. The source is bakeable up to 250° C and can be cleaned by internal "degassing".
   
   

 

 

 

 


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IQE 11/35 Product Brochure
SPECS Ion Source IQE 11/35  
   
   


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