Ion Source IQE 11/35 - Sputter Gun



Features: High ion beam current Beam free of impurities Suitable for reactive gases, like Oxygen Insertion depth adaptable to requirements Long term stable operation Excellent price/performance ratio Available with either analog or digital power supply Application: Sputter Gun: Sputter cleaning of samples in UHV Product Description:
Cross Section through IQE 11/35		The IQE 11/35 is a very stable extractor type ion source operating with a long-lifetime special Yttrium oxide coated Iridium filament. As a compact, easy-to-handle extractor type ion source the IQE 11/35 is suitable for reactive and non-reactive gases. The source is mounted on a 2.75" (NW35CF) flange and is available with a digital or an analog power supply. The IQE 11/35 generates an ion current of 10-15 µA (Argon) with a Gaussian beam profile. The beam diameter (FWHM) and current density depend on the source-to-sample distance.
The mounting length of the source is adaptable to individual requirements (standard 62.5 mm). The direct gas transfer in the ionization area works via a gas line on an integrated Mini-Conflat Flange (NW16CF). Typically, the pressure in the UHV chamber remains in the 10^-5 to 10^-6 hPa range during operation. The source is bakeable up to 200° C and can be cleaned by internal "degassing".