• Scannable
• Large scan area
  
• Special filament for long lifetime and operation with reactive gases
• Differential pumping for low pressure applications
• Power supply with integrated scan and deflection unit
• Keystone correction for depth profiling at tilted angles
  
• Suitable for reactive gases

• Sputter Gun: Cleaning and etching (sputtering) of any surface with fine focus
• Depth profiling in AES, XPS, SSXPS
• Primary ion source for SIMS, SNMS, ISS
• Scanning applications

Product Description:
The ion source IQE 12/38 is an extractor type, differentially pumped ion source producing a focused, scannable ion beam of high current density. It is a dedicated small spot source for depth profiling, ISS and SIMS.
The IQE 12/38 is mounted on a rotatable 2.75" O.D. (DN38CF) flange. It operates with a filament and ionizes the gas by electron bombardment.
At its standard flange-to-sample distance is 186 mm, which corresponds to a working distance of 23 mm, it generates a beam current up to 0.8 µA at a spot size of 125 µm.
The two lens system of the source allows easy changing of the spot size, which is continuously variable from 125 µm to 1000 µm. For a spot size of 800 µm the ion current is up to 8 µA. The corresponding current density is 1-4 mA/cm² depending on the spot size (these performance data have been proven in the field and can be considered as conservative).