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   Your location > Systems > Stand-alone Systems > INA-X (SNMS/SIMS)

Technical Data INA-X

1. Plasma Chamber (Ion source and post ionizer)

ECWR plasma: (HF-Excitation with single loop coil at 27 MHz and static magnetic field via two Helmholtz coils)
 Low pressure Ar plasma 5 x 10-4 - 2 x 10-3 mbar
Ion energy: 100 eV - 2 keV
Ion current: up to 1 mA
Typical sputter rates: 0,5 nm/s @ 130 eV Ion energy
5 nm/s @ 1 keV Ion energy
Analyzed area: 2-14 mm
Post ionization efficiency: ~ 1 %

The HF-field is screened by a metal housing.
The Ar pressure is automatically regulated via a piezo electric valve.

2. Detection System

Ion optics: 45 sector analyzer
Detection angle: 30
Mass spectrometer: Balzers QMG 422, differentially pumped
Mass range: 0 - 340 amu
Detector: Secondary Electron multiplier (SEM), Single Ion counting

3. Sample Transfer

Automatic sample transfer facility with load lock system, gate valve and storage facility for up to 5 samples
Sample size: up to 14 mm diameter and up to 5 mm thickness

4. Vacuum System

UHV-System consisting of Plasma chamber, load lock chamber and sample transfer system, including pumps, valves and pressure measuring unit




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